Model Number | E1R | E2R | E1M | E2M | E3M |
---|---|---|---|---|---|
Temperature Range |
E1RL 600 to 1800 °C (1112 to 3272 °F) (2 color mode) 550 to 1800 °C (1022 to 3272 °F) (single color mode) E1RH 1000 to 3200 ºC (1832 to 5792 ºF) |
E2RL 250 to 1200 ºC (482 to 2192 ºF) |
E1ML 400 to 1740 ºC (752 to 3164 ºF) E1MH 540 to 3000 ºC (1004 to 5432 ºF) |
E2ML 250 to 1100 ºC (482 to 2012 ºF) E2MM 250 to 1400 ºC (482 to 2552 °F) E2MH 450 to 2250 ºC (842 to 4082 ºF) |
E3ML 50 to 1000 ºC (122 to 1832 ºF) E3MH 150 to 1800 ºC (302 to 3272 ºF) |
Spectral Response |
1.0 μm nominal one/two color |
1.6 μm nominal one/two color |
1.0 μm nominal single color |
1.6 μm nominal single color |
2.4 μm nominal single color |
Accuracy* |
E1RL ±(0.5 % +2 °C) no attenuation E1RH ±(0.5 % +2 °C) for Tmeas < 3000°C (5432°F) no attenuation Temperature indication only for Tmeas ≥ 3000°C (5432 °F) |
E2RL ±(0.5 % +2 °C) for Tmeas ≥ 270°C (518°F) no attenuation Tmeas in °C |
E1ML ±(0.3 % + 1 °C) for Tmeas ≥450°C (842°F) ±(2 % + 2 °C) for Tmeas <450°C (842°F) E1MH ±(0.3 % + 1 °C) for Tmeas ≥ 650°C (1202°F) ±(2 % + 2 °C) for Tmeas < 650°C (1202°F) |
E2ML ±(0.3 % + 2 °C) E2MM ±(0.3 % + 2 °C) for Tmeas ≥ 350°C (662°F) ±(1 % + 2 °C) for Tmeas <350°C (662°F) E2MH ±(0.3 % + 1 °C) |
E3ML ±(0.3 % + 1 °C) for Tmeas ≥ 100°C ±(1 % + 2 °C) for Tmeas < 100°C E3MH ±(0.3 % + 1 °C) |
Repeatability* |
±(0.3 % +1°C) no attenuation Tmeas in °C |
±(0.3 % +1°C) for Tmeas ≥ 270°C (518°F) no attenuation Tmeas in °C |
E1ML ±(0.1 % + 1 °C) for Tmeas ≥450°C (842°F) ±(1 % + 1 °C) for Tmeas <450°C (842°F) E1MH ±(0.1 % + 1 °C) for Tmeas ≥ 650°C (1202°F) ±(1 % + 1 °C) for Tmeas < 650°C (1202°F) |
E2ML ±(0.1 % + 1 °C) E2MM ±(0.1 % + 1 °C) for Tmeas ≥ 350°C (662°F) ± (1% + 1°C) for Tmeas <350°C (662°F) E2MH ± (0.1 % + 1 °C) |
E3ML ±(0.1 % + 1 °C) for Tmeas ≥ 100°C (212°F) ±(1 % + 1 °C) for Tmeas < 100°C (212°F E3MH ± (0.1 % + 1 °C) |
Response Time | 10 ms (95 %) | 20 ms (95 %) | 2 ms (95 %) | 2 ms (95 %) | 20 ms (95 %) |
Optical Resolution (D:S) |
E1RL - 100:1 E1RH - 150:1 |
E2RL - 75:1 |
E1ML - 160:1 E1MH - 300:1 |
E2ML - 160:1 E2MM - 160:1 E2MH - 300:1 |
E3ML - 100:1 E3MH - 300:1 |
Lens Options | 600 mm – ∞ (24” – ∞) (F2), 300 - 600 mm (12 - 24”) (F1), 190-300 mm (7.5 - 12”) (F0) | ||||
Temperature Resolution | Digital Output 0.1 °C, Current Output <0.03 °C / 16 bit | ||||
Emissivity | 0.100 to 1.100 | ||||
Signal Processing | Peak Hold, Valley Hold, Averaging, Ambient background temperature compensation | ||||
E-Slope | 0.850 to 1.150 | N/A | |||
Standards and Compliance |
EC – Directive 2014/30/EU – EMC EC – Directive 2011/65/EU – RoHS Compliance amended by Directive (EU) 2015/863 EN 61326-1: 2013 - Electrical measurement, control and laboratory devices - Electromagnetic susceptibility (EMC) EN 50581: 2012 - Technical documentation for the evaluation of electrical products with respect to restriction of hazardous substances (RoHS) KCC |
Model Number | EF1R | EF2R | EF1M | EF2M |
---|---|---|---|---|
Temperature Range |
EF1RL 500 to 1100 °C (932 to 2012 °F) EF1RM 700 to 1500 °C (1292 to 2732 °F) EF1RH 1000 to 3200 ºC (1832 to 5792 ºF) |
EF2RL 275 to 1300 ºC (527 to 2372 ºF) EF2RH 350 to 1300 ºC (662 to 2372 ºF) |
EF1ML 475 to 900 ºC (887 to 1652 ºF) EF1MM 800 to 1900 °C (1472 to 3452 °F) EF1MH 1200 to 3000 ºC (2192 to 5432 ºF) |
EF2ML 250 to 800 ºC (482 to 1472 ºF) EF2MH 400 to 1700 °C (752 to 3092 °F) |
Spectral Response |
1.0 μm nominal one/two color |
1.6 μm nominal one/two color |
1.0 μm nominal single color |
1.6 μm nominal single color |
Optical Resolution (D:S) (95 % energy) |
EF1RL - 20:1 EF1ML - 40:1 EF1RH - 65:1 |
EF2RL - 20:1 EF2RH - 40:1 (90 % energy) |
EF1ML - 20:1 EF1MM - 100:1 EF1MH - 100:1 |
EF2ML - 20:1 EF2MH - 40:1 |
System Accuracy |
±(0.3 % Tmeas. + 2 °C) no attenuation |
±(0.5 % Tmeas. + 2 °C) no attenuation |
±(0.3 % Tmeas. + 2 °C) | |
Repeatability |
±1 °C (±2 °F) no attenuation |
±1 °C (±2 °F) no attenuation |
±1 °C (±2 °F) | |
Response Time | 10 ms (95 %) | 25 ms (95 %) | 2 ms (95 %) | |
Sighting | Laser Optional (depending on the model) | |||
Temperature Resolution | Digital Output 0.1 °C, Current Output <0.03 °C / 16 bit | |||
Emissivity | 0.100 to 1.100 | |||
Signal Processing |
Peak Hold, Valley Hold, Averaging, Ambient background temperature compensation | |||
E-Slope | 0.850 to 1.150 | N/A | ||
Standards and Compliance |
EC – Directive 2014/30/EU – EMC EC – Directive 2011/65/EU – RoHS Compliance amended by Directive (EU) 2015/863 EN 61326-1: 2013 - Electrical measurement, control and laboratory devices - Electromagnetic susceptibility (EMC) EN 50581: 2012 - Technical documentation for the evaluation of electrical products with respect to restriction of hazardous substances (RoHS) KCC |
Endurance Model Spectral Response |
Applications |
---|---|
E1R 1.0 μm nominal one/two color |
High temperature, more difficult processes: blast furnaces, hot rolling mills, induction heating, vacuum furnaces, kilns, molten metals, thin wires or rods |
E2R 1.6 µm nominal one/two color |
Medium temperature processes: induction heating, vacuum furnaces, kilns, molten metals, thin wires or rods, glass fiber production |
E1M 1.0 µm nominal single color |
Semiconductor, metals forging, hardening & molten glass, glass vial and syringe production |
E2M 1.6 µm nominal single color |
Ferrous, non ferrous and unoxidized metals, galvanizing lines & steel annealing, small targets such as in wire coating & annealing, plastic tubing extrusions |
E3M 2.4 µm nominal single color |
Ferrous, non ferrous and unoxidized metals, galvanizing lines & steel annealing |
Endurance Model Spectral Response |
Applications |
---|---|
EF1R 1.0 µm nominal one/two color |
Metals processing: molten metal forging, heat treating and annealing, continuous casting, induction heating, lightbulb and halogen lamp production, cement and lime kilms, vacuum furnaces, thin wires or rods, aluminum processing |
EF2R 1.6 µm nominal one/two color |
Metals processing: metal forging, heat treating and annealing, induction heating, cement and lime kilms, vacuum furnaces, thin wires or rods, |
EF1M 1.0 µm nominal single color |
Metals processing, metal forging, hot rolling mills, heat treating and annealing, induction heating, glass melting, semiconductor furnaces |
EF2M 1.6 µm nominal single color |
Ferrous and non-ferrous metals, galvanizing lines, metals processing, molten metal forging, hot rolling mills, heat treating and annealing, induction heating |